Au-delà de soleil (2024, ongoing)
Artist book exploring DUV and EUV photolithography as a contemporary imaging technology through photographs, archival material, and speculative microchip structures. Self-published, 400 pages, edition of 6. #####
Au-delà du soleil approaches DUV and EUV photolithography through photographs, archival material, and speculative visual constructions. The work began with visits to
a cleanroom, where I not only photographed machines, silicon wafers, and lithograph-ic patterns, but also worked directly with lithography equipment, exposing patterns
onto silicon myself. From this work in the
cleanroom, the book develops visual compositions structured around density, layer relations, gaps, resolution, scale, rhythm, and repetition.
It situates photolithography within a longer history of pattern-making, from weaving and knotting to the micro- and nanoscale structures of contemporary chip production, and draws on broader relationships between light and matter — from solar radiation to the extreme ultraviolet wavelengths used in
semiconductor fabrication.
Au-delà de soleil (2024, ongoing), cover
A central section presents two speculative, deliberately non-functional microchips. Their layered architectures — metal layers, patterning steps, and structural geometries
— are visually explored as a way to express the stratified logic of chip fabrication. Archival imagery is recomposed and layered
into new constellations. Text fragments and technical notes provide additional entry points into the technology and its visual logic. The book is still in progress. The current version forms a first edition assembling an evolving collection of images, reflections, and discoveries on photolithography and pattern formation within the semiconductor industry
